The Effect of Defects on the Optical Nonlinearity of Thermally Poled SiOx Thin Films
Defects were deliberately induced in SiOx thin films during their deposition using a helicon plasma activated reactive evaporation technique. The films were thermally poled and the poling induced second-order optical nonlinearity was investigated by measuring the second harmonic generation of the samples. It was found that oxygen-rich SiOx thin films containing mainly peroxy radicals enabled a much larger optical nonlinearity than stoichiometric SiO2 films after poling, and their optical...[Show more]
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|Source:||Thin Solid Films|
|01_Li_The_Effect_of_Defects_on_the_2008.pdf||194.63 kB||Adobe PDF|
|02_Li_The_Effect_of_Defects_on_the_2008.pdf||200.39 kB||Adobe PDF|
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