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The Effect of Defects on the Optical Nonlinearity of Thermally Poled SiOx Thin Films

Li, Wei; Boswell, Roderick; Samoc, Marek; Samoc, Anna; Wang, Rongping

Description

Defects were deliberately induced in SiOx thin films during their deposition using a helicon plasma activated reactive evaporation technique. The films were thermally poled and the poling induced second-order optical nonlinearity was investigated by measuring the second harmonic generation of the samples. It was found that oxygen-rich SiOx thin films containing mainly peroxy radicals enabled a much larger optical nonlinearity than stoichiometric SiO2 films after poling, and their optical...[Show more]

CollectionsANU Research Publications
Date published: 2008
Type: Journal article
URI: http://hdl.handle.net/1885/35656
Source: Thin Solid Films
DOI: 10.1016/j.tsf.2007.07.027

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