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Magnetic hexapole lens focusing of a metastable helium atomic beam for UV-free lithography

Chaustowski, Rene; Leung, V.; Baldwin, Kenneth


Sources of rare gas atoms in excited metastable states have been used to expose photoresist-coated substrates to demonstrate atom lithography. These thermal atomic beams are usually created by discharge sources that also produce copious amounts of UV radiation. The UV radiation simultaneously illuminates the substrate and may play a complementary role in altering the photoresist together with the metastable atoms. In the experiments reported here, we have isolated the UV component using a...[Show more]

CollectionsANU Research Publications
Date published: 2007
Type: Journal article
Source: Applied Physics B: Lasers and Optics
DOI: 10.1007/s00340-006-2497-2


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