Skip navigation
Skip navigation

Nano-phase separation of Arsenic Tri-sulphide (As 2 S 3 ) film and its effect on Plasma Etching

Choi, Duk-Yong; Madden, Steve; Wang, Rongping; Rode, Andrei V; Krolikowska, Maryla; Luther-Davies, Barry

Description

We present evidence of nano-scale phase separation in amorphous arsenic tri-sulphide films prepared by ultra-fast pulsed laser deposition based on Raman spectroscopy, X-ray photo-electron spectroscopy, and atomic force microscopy. We also show the results from plasma etching this material and conclude that the grainy structure of etched surfaces comes from the differential chemical etch rates of the different phases.

CollectionsANU Research Publications
Date published: 2007
Type: Journal article
URI: http://hdl.handle.net/1885/33880
Source: Journal of Non-crystalline Solids
DOI: 10.1016/j.jnoncrysol.2006.12.102

Download

File Description SizeFormat Image
01_Choi_Nano-phase_separation_of_2007.pdf843.42 kBAdobe PDF    Request a copy


Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  20 July 2017/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator