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Suppression of the internal electric field effects in ZnO/Zn0.7Mg0.3O quantum wells by ion-implantation induced intermixing

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Davis, Jeff A; Dao, Lap Van; Wen, X; Ticknor, C; Hannaford, Peter; Coleman, Victoria A; Jagadish, Chennupati; Koike, Kazuto; Sasa, Shigehiko; Inoue, Masataka; Yano, Mitsuaki; Tan, Hark Hoe

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Strong suppression of the effects caused by the internal electric field in ZnO/ZnMgO quantum wells following ion-implantation and rapid thermal annealing, is revealed by photoluminescence, time-resolved photoluminescence, and band structure calculations.

dc.contributor.authorDavis, Jeff A
dc.contributor.authorDao, Lap Van
dc.contributor.authorWen, X
dc.contributor.authorTicknor, C
dc.contributor.authorHannaford, Peter
dc.contributor.authorColeman, Victoria A
dc.contributor.authorJagadish, Chennupati
dc.contributor.authorKoike, Kazuto
dc.contributor.authorSasa, Shigehiko
dc.contributor.authorInoue, Masataka
dc.contributor.authorYano, Mitsuaki
dc.contributor.authorTan, Hark Hoe
dc.date.accessioned2015-12-08T22:26:15Z
dc.date.available2015-12-08T22:26:15Z
dc.identifier.issn0957-4484
dc.identifier.urihttp://hdl.handle.net/1885/33603
dc.description.abstractStrong suppression of the effects caused by the internal electric field in ZnO/ZnMgO quantum wells following ion-implantation and rapid thermal annealing, is revealed by photoluminescence, time-resolved photoluminescence, and band structure calculations.
dc.publisherInstitute of Physics Publishing
dc.sourceNanotechnology
dc.subjectKeywords: Band structure; Electric field effects; Interfaces (materials); Ion implantation; Photoluminescence; Rapid thermal annealing; Zinc oxide; Electron-hole wavefunction overlap; Exciton lifetime; Oscillator strength; Stark shift; Semiconductor quantum wells;
dc.titleSuppression of the internal electric field effects in ZnO/Zn0.7Mg0.3O quantum wells by ion-implantation induced intermixing
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume19
dc.date.issued2008
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationu3488905xPUB104
local.type.statusPublished Version
local.contributor.affiliationDavis, Jeff A, Swinburne University of Technology
local.contributor.affiliationDao, Lap Van, Swinburne University of Technology
local.contributor.affiliationWen, X, Swinburne University of Technology
local.contributor.affiliationTicknor, C, Swinburne University of Technology
local.contributor.affiliationHannaford, Peter, Swinburne University of Technology
local.contributor.affiliationColeman, Victoria A, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationTan, Hoe Hark, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationJagadish, Chennupati, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationKoike, Kazuto, Osaka Institute of Technology
local.contributor.affiliationSasa, Shigehiko, Osaka Institute of Technology
local.contributor.affiliationInoue, Masataka, Osaka Institute of Technology
local.contributor.affiliationYano, Mitsuaki, Osaka Institute of Technology
local.bibliographicCitation.issue5
local.bibliographicCitation.startpage1
local.bibliographicCitation.lastpage4
local.identifier.doi10.1088/0957-4484/19/05/055205
dc.date.updated2015-12-08T09:10:25Z
local.identifier.scopusID2-s2.0-38349000729
local.identifier.thomsonID000252967100005
CollectionsANU Research Publications

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