Surface oxidation of Al masks for deep dry-etch of silica optical waveguides
The surface oxidation of Al metal masks in an oxygen plasma was studied for realizing deep dry-etch of silica optical waveguides. The oxidation efficiency of the plasma was found to depend on mainly substrate bias and plasma power. Net sputtering effect happened when ion bombarding potential exceeds certain critical value. However, suitable ion bombarding energy is of benefit to the oxidation process. There was a saturation thickness of the Al2O3 layer, beyond which the growth rate of Al2O3...[Show more]
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|Source:||Surface and Coatings Technology|
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