Skip navigation
Skip navigation
The system will be down for maintenance between 8:00 and 8:15am on Wednesday 12, December 2018

Tailoring of Epitaxial CoSi2/Si Nanostructures by Low Temperature Wet Oxidation

Kluth, Patrick; Zhao, Qing Tai; Winnerl, Stephan; Lenk, Stefan; Mantl, Siegfried


We have investigated a process for tailoring of epitaxial CoSi 2/Si nanostructures using low temperature wet oxidation. A separation between two CoSi2 layers on a Si substrate in the range of 60 nm is generated by a self-assembly process. During subsequent low temperature wet oxidation, SiO2 formation on top of the silicide layers pushes the latter into the substrate. At the edges of the gap, the silicide layers are shifted in both and directions, leading to an effective reduction of the...[Show more]

CollectionsANU Research Publications
Date published: 2005
Type: Journal article
Source: Nanotechnology
DOI: 10.1088/0957-4484/16/11/042


File Description SizeFormat Image
01_Kluth_Tailoring_of_Epitaxial_2005.pdf458.94 kBAdobe PDF    Request a copy

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  27 November 2018/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator