Novel Preparation Methods for the Fabrication of Thin-Film EXAFS Samples
Thin-film EXAFS samples have been fabricated using semiconductor-processing and wet-chemical etching techniques to eliminate artifacts associated with transmission and fluorescence measurements. Examples include crystalline Ge xSi1-x alloys, amorphous GaAs and Cu and Au nanocrystals in SiO2. In general, thin films of several microns thickness were first formed on bulk substrates then EXAFS samples were fabricated by separating the thin film and substrate. For transmission measurements, thin...[Show more]
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