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Thermal stability of silicon surface passivation by APCVD Al 2 O 3

Black, Lachlan; Allen, Thomas; Cuevas, Andres; McIntosh, Keith; Veith, Boris; Schmidt, Jan


We investigate the thermal stability of silicon surface passivation provided by aluminium oxide (Al2O3) films deposited using atmospheric pressure chemical vapour deposition (APCVD) and fired in a belt furnace at a peak temperature of ~810 C. Firing stabi

CollectionsANU Research Publications
Date published: 2014
Type: Journal article
Source: Solar Energy Materials and Solar Cells
DOI: 10.1016/j.solmat.2013.05.048


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