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Characterization of Epitaxial Heavily Doped Silicon Regions Formed by Hot-Wire Chemical Vapor Deposition Using Micro-Raman and Microphotoluminescence Spectroscopy

Rahman, Tasmit; Nguyen, Hieu; Tarazona, Antulio; Shi, Jingxing; Han, Young-Joon; Franklin, Evan; Macdonald, Daniel; Boden, Stuart A


We report on the characterization of heavily boron doped epitaxial silicon regions grown in a hot-wire chemical vapor deposition tool, using micro-Raman and photoluminescence spectroscopy. In particular, the use of this approach for emitter fabrication in an interdigitated back contact silicon solar cell is studied, by analyzing its suitability concerning selective growth, uniformity, anneal time, and luminescent defects. We show that by reducing the silane flow rate, both the required...[Show more]

CollectionsANU Research Publications
Date published: 2018
Type: Journal article
Source: IEEE Journal of Photovoltaics
DOI: 10.1109/JPHOTOV.2018.2818284
Access Rights: Open Access


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