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Surface Modification of Silicon Nano Mechanical Structures by Carbon Ion Implantation for Post-fabrication Transformation to Silicon Carbide

Virwani, Kumar; Sood, Dinesh Kumar; Elliman, Robert; Malshe, Ajay P

Description

Internal stresses can cause de-lamination and fracture of coatings and structures and it is well known that ion-implantation can be used to control such behavior through modification of the stress. Here, however, we show that the unique ability of implantation to create controlled stresses in materials by altering both the chemical composition and mechanical properties, combined with an increase in the bending strength of materials, can used to create novel vertical nanostructures. Silicon...[Show more]

dc.contributor.authorVirwani, Kumar
dc.contributor.authorSood, Dinesh Kumar
dc.contributor.authorElliman, Robert
dc.contributor.authorMalshe, Ajay P
dc.coverage.spatialBoston USA
dc.date.accessioned2015-12-08T22:08:25Z
dc.date.available2015-12-08T22:08:25Z
dc.date.createdNovember 28-December 2 2005
dc.identifier.urihttp://hdl.handle.net/1885/28603
dc.description.abstractInternal stresses can cause de-lamination and fracture of coatings and structures and it is well known that ion-implantation can be used to control such behavior through modification of the stress. Here, however, we show that the unique ability of implantation to create controlled stresses in materials by altering both the chemical composition and mechanical properties, combined with an increase in the bending strength of materials, can used to create novel vertical nanostructures. Silicon cantilevers (beams), 193nm thick, 200nm wide and 3μm long, were implanted with carbon ions to create a buried SiCx layers. The internal stresses generated by implantation caused the beams to bend at angles ranging from 10 degrees to greater than 90 degrees, leading to unique vertical nanostructures. This method can be used to create 3-D nano electromechanical systems (NEMS).
dc.publisherMaterials Research Society
dc.relation.ispartofseriesMaterials Research Society Meeting Fall 2005
dc.sourceMRS Proceedings
dc.source.urihttp://www.mrs.org
dc.subjectKeywords: Nano mechanical structures; Silicon cantilevers; Carbon; Delamination; Ion implantation; Mechanical properties; NEMS; Residual stresses; Silicon; Silicon carbide; Surface treatment; Nanostructures
dc.titleSurface Modification of Silicon Nano Mechanical Structures by Carbon Ion Implantation for Post-fabrication Transformation to Silicon Carbide
dc.typeConference paper
local.description.notesImported from ARIES
local.description.refereedYes
dc.date.issued2006
local.identifier.absfor020405 - Soft Condensed Matter
local.identifier.ariespublicationU4047546xPUB59
local.type.statusPublished Version
local.contributor.affiliationVirwani, Kumar, University of Arkansas
local.contributor.affiliationSood, Dinesh Kumar, RMIT University
local.contributor.affiliationElliman, Robert, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationMalshe, Ajay P, University of Arkansas
local.bibliographicCitation.startpage0908-OO16-03.1-6
dc.date.updated2015-12-08T07:17:10Z
local.identifier.scopusID2-s2.0-34249937116
CollectionsANU Research Publications

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