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Passivation of Crystalline Silicon Using Silicon Nitride

Cuevas, Andres; Kerr, Mark; Schmidt, Jan

Description

The extraordinary capacity of plasma-enhanced chemical-vapour-deposited (PECVD) silicon nitride (SiN) to passivate the surface of crystalline silicon wafers and, in the case of multicrystalline silicon, improve the bulk material by hydrogenation has attracted a great deal of research and development. This review summarizes the state of the art of surface passivation by PECVD SiN, together with the present understanding of the physical mechanisms that underlie it. The impact of SiN on ultimate...[Show more]

CollectionsANU Research Publications
Date published: 2003
Type: Conference paper
URI: http://hdl.handle.net/1885/28305
Source: WCPEC-3: Proceedings of 3rd World Conference on Photovoltaic Energy Conversion
DOI: 10.1109/WCPEC.2003.1305001

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