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Threshold reduction and yield improvement of semiconductor nanowire lasers via processing-related end-facet optimization

Alanis, Juan Arturo; Chen, Qian; Lysevych, Mykhaylo; Burgess, Timothy; Li, Li; Liu, Zhu; Tan, Hark Hoe; Jagadish, Chennupati; Parkinson, Patrick

Description

Both gain medium design and cavity geometry are known to be important for low threshold operation of semiconductor nanowire lasers. For many applications nanowire lasers need to be transferred from the growth substrate to a low-index substrate; however, the impact of the transfer process on optoelectronic performance has not been studied. Ultrasound, PDMS-assisted and mechanical rubbing are the most commonly used methods for nanowire transfer; each method may cause changes in the fracture point...[Show more]

CollectionsANU Research Publications
Date published: 2019
Type: Journal article
URI: http://hdl.handle.net/1885/261303
Source: Nanoscale Advances
DOI: 10.1039/c9na00479c
Access Rights: Open Access

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