Skip navigation
Skip navigation

Redefinition of the self-bias voltage in a dielectrically shielded thin sheath RF discharge

Ho, Teck Seng; Charles, Christine; Boswell, Rod

Description

In a geometrically asymmetric capacitively coupled discharge where the powered electrode is shielded from the plasma by a layer of dielectric material, the self-bias manifests as a nonuniform negative charging in the dielectric rather than on the blocking capacitor. In the thin sheath regime where the ion transit time across the powered sheath is on the order of or less than the Radiofrequency (RF) period, the plasma potential is observed to respond asymmetrically to extraneous impedances in...[Show more]

dc.contributor.authorHo, Teck Seng
dc.contributor.authorCharles, Christine
dc.contributor.authorBoswell, Rod
dc.date.accessioned2021-11-25T22:48:21Z
dc.date.available2021-11-25T22:48:21Z
dc.identifier.issn0021-8979
dc.identifier.urihttp://hdl.handle.net/1885/251971
dc.description.abstractIn a geometrically asymmetric capacitively coupled discharge where the powered electrode is shielded from the plasma by a layer of dielectric material, the self-bias manifests as a nonuniform negative charging in the dielectric rather than on the blocking capacitor. In the thin sheath regime where the ion transit time across the powered sheath is on the order of or less than the Radiofrequency (RF) period, the plasma potential is observed to respond asymmetrically to extraneous impedances in the RF circuit. Consequently, the RF waveform on the plasma-facing surface of the dielectric is unknown, and the behaviour of the powered sheath is not easily predictable. Sheath circuit models become inadequate for describing this class of discharges, and a comprehensive fluid, electrical, and plasma numerical model is employed to accurately quantify this behaviour. The traditional definition of the self-bias voltage as the mean of the RF waveform is shown to be erroneous in this regime. Instead, using the maxima of the RF waveform provides a more rigorous definition given its correlation with the ion dynamics in the powered sheath. This is supported by a RF circuit model derived from the computational fluid dynamics and plasma simulations.
dc.format.mimetypeapplication/pdf
dc.language.isoen_AU
dc.publisherAmerican Institute of Physics (AIP)
dc.rights© 2018 American Institute of Physics
dc.sourceJournal of Applied Physics
dc.titleRedefinition of the self-bias voltage in a dielectrically shielded thin sheath RF discharge
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume123
dc.date.issued2018
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationa383154xPUB10067
local.publisher.urlhttp://jap.aip.org/
local.type.statusPublished Version
local.contributor.affiliationHo, Teck Seng, College of Science, ANU
local.contributor.affiliationCharles, Christine, College of Science, ANU
local.contributor.affiliationBoswell, Roderick, College of Science, ANU
local.bibliographicCitation.issue19
local.bibliographicCitation.startpage1
local.bibliographicCitation.lastpage15
local.identifier.doi10.1063/1.5023076
dc.date.updated2020-11-23T11:52:17Z
local.identifier.scopusID2-s2.0-85047211067
dcterms.accessRightsOpen Access
dc.provenancehttps://v2.sherpa.ac.uk/id/publication/9867..."The Published Version can be archived in a Non-Commercial Institutional Repository" from SHERPA/RoMEO site (as at 26/11/2021). This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (Ho, Teck Seng, Christine Charles, and Rod Boswell. "Redefinition of the self-bias voltage in a dielectrically shielded thin sheath RF discharge." Journal of Applied Physics 123.19 (2018): 193301.) and may be found at https://dx.doi.org/10.1063/1.5023076
CollectionsANU Research Publications

Download

File Description SizeFormat Image
01_Ho_Redefinition_of_the_self-bias_2018.pdf3.19 MBAdobe PDFThumbnail


Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  19 May 2020/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator