Elliman, Robert; Spooner, M G; Dall (previously Weijers), Tessica; Kim, Tae-Hyun; Fletcher, Neville H
Cracks that propagate with near-perfect sinusoidal form are reported in amorphous silicon-rich silica films deposited onto (001) silicon substrates by plasma-enhanced chemical vapour deposition and subjected to thermal annealing. The cracks are shown to result from high tensile stresses that develop in the film during thermal annealing at temperatures in the range up to 700C, a process shown to be correlated with the loss of hydrogen from the films. Two distinct modes of crack propagation are...[Show more]
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