Skip navigation
Skip navigation

Metastable CF and CF2 molecules in CF4 inductively-coupled plasmas

Booth, Jean-Paul; Corr, Cormac


The radicals CF and CF2, which are important intermediates in fluorocarbon plasma chemistry, both have low-lying metastable levels ( 4CF at 3.54 eV and 3CF2 at 2.46 eV). Recent calculations (Rozum et al 2006 J. Phys. Chem. Ref. Data in press) indicate that electron-impact excitation of the ground-state radicals into these states could be fast. A recent study of inductively-coupled plasmas (ICP) in low-pressure CF4 (Booth et al 2005 Plasma Sources Sci. Technol. 14 273) indicated the presence of...[Show more]

CollectionsANU Research Publications
Date published: 2006
Type: Journal article
Source: Plasma Sources Science and Technology
DOI: 10.1088/0963-0252/15/1/017


File Description SizeFormat Image
01_Booth_Metastable_CF_and_CF2_2006.pdf298.83 kBAdobe PDF    Request a copy

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  17 November 2022/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator