Negative ions in single and dual frequency capacitively coupled fluorocarbon plasmas Yes
We have studied charged particle densities and fluxes in a customized industrial etch reactor, running in Ar/O2/c-C4F8 gas mixtures at pressures in the region of 50 mTorr and driven by 2 and 27 MHz RF power, either separately or simultaneously. Independent control of ion flux and ion energy is the aim of using dual frequency plasmas. However, little experimental data exists regarding the charged particle dynamics in complex industrial gas mixtures. Negative ions could play an important role in...[Show more]
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|Source:||Plasma Sources Science and Technology|
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