Skip navigation
Skip navigation

Negative ions in single and dual frequency capacitively coupled fluorocarbon plasmas Yes

Curley, Garret A; Maric, Dragana; Booth, Jean-Paul; Corr, Cormac; Chabert, Pascal; Guillon, Jean

Description

We have studied charged particle densities and fluxes in a customized industrial etch reactor, running in Ar/O2/c-C4F8 gas mixtures at pressures in the region of 50 mTorr and driven by 2 and 27 MHz RF power, either separately or simultaneously. Independent control of ion flux and ion energy is the aim of using dual frequency plasmas. However, little experimental data exists regarding the charged particle dynamics in complex industrial gas mixtures. Negative ions could play an important role in...[Show more]

CollectionsANU Research Publications
Date published: 2007
Type: Journal article
URI: http://hdl.handle.net/1885/24038
Source: Plasma Sources Science and Technology
DOI: 10.1088/0963-0252/16/1/S09

Download

File Description SizeFormat Image
01_Curley_Negative_ions_in_single_and_2007.pdf466.3 kBAdobe PDF    Request a copy


Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  12 November 2018/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator