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Negative ions in single and dual frequency capacitively coupled fluorocarbon plasmas Yes

Curley, Garret A; Maric, Dragana; Booth, Jean-Paul; Corr, Cormac; Chabert, Pascal; Guillon, Jean


We have studied charged particle densities and fluxes in a customized industrial etch reactor, running in Ar/O2/c-C4F8 gas mixtures at pressures in the region of 50 mTorr and driven by 2 and 27 MHz RF power, either separately or simultaneously. Independent control of ion flux and ion energy is the aim of using dual frequency plasmas. However, little experimental data exists regarding the charged particle dynamics in complex industrial gas mixtures. Negative ions could play an important role in...[Show more]

CollectionsANU Research Publications
Date published: 2007
Type: Journal article
Source: Plasma Sources Science and Technology
DOI: 10.1088/0963-0252/16/1/S09


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