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Stress and Stress Relief in Dielectric Thin Films - The Role of Hydrogen

Elliman, Robert; Dall (previously Weijers), Tessica; Spooner, M G; Kim, Tae-Hyun; Wilkinson, Andrew

Description

Novel crack propagation modes are reported in amorphous silicon-rich oxide (SiOx) films deposited onto (1 0 0) silicon substrates and subjected to thermal annealing. These include the formation of straight cracks aligned with 〈0 0 1〉 directions in the

dc.contributor.authorElliman, Robert
dc.contributor.authorDall (previously Weijers), Tessica
dc.contributor.authorSpooner, M G
dc.contributor.authorKim, Tae-Hyun
dc.contributor.authorWilkinson, Andrew
dc.date.accessioned2015-12-07T22:39:24Z
dc.identifier.issn0168-583X
dc.identifier.urihttp://hdl.handle.net/1885/23851
dc.description.abstractNovel crack propagation modes are reported in amorphous silicon-rich oxide (SiOx) films deposited onto (1 0 0) silicon substrates and subjected to thermal annealing. These include the formation of straight cracks aligned with 〈0 0 1〉 directions in the
dc.publisherElsevier
dc.sourceNuclear Instruments and Methods in Physics Research: Section B
dc.subjectKeywords: Annealing; Cracks; Hydrogen; Oscillations; Plasma enhanced chemical vapor deposition; Silica; Stress relief; Stresses; Substrates; Tensile stress; Thermal effects; Thin films; Annealing temperature; Dielectric thin films; ERD; PECVD; Dielectric films Crack; ERD; Hydrogen; PECVD; Stress; Thin film
dc.titleStress and Stress Relief in Dielectric Thin Films - The Role of Hydrogen
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume249
dc.date.issued2006
local.identifier.absfor020406 - Surfaces and Structural Properties of Condensed Matter
local.identifier.ariespublicationu4047546xPUB29
local.type.statusPublished Version
local.contributor.affiliationElliman, Robert, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationDall (previously Weijers), Tessica, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationSpooner, M G, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationKim, Tae-Hyun, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationWilkinson, Andrew, College of Physical and Mathematical Sciences, ANU
local.description.embargo2037-12-31
local.bibliographicCitation.startpage310
local.bibliographicCitation.lastpage313
local.identifier.doi10.1016/j.nimb.2006.04.018
dc.date.updated2015-12-07T10:48:46Z
local.identifier.scopusID2-s2.0-33745818576
CollectionsANU Research Publications

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