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Transport and Deposition of Plasma-Sputtered Platinum Atoms: Comparison Between Experiments and Simulation

Caillard, A.; Charles, Christine; Boswell, Roderick; Brault, Pascal

Description

The deposition of platinum atoms by argon plasma sputtering has been simulated by using a 3-D Monte Carlo simulation called Sputtered Particles Transport in Gas, which provides spatial and energy distributions of the Pt atoms impinging on the substrate and on the chamber walls. The Yamamura formula provides the Pt sputtering yield from argon ions, whereas the initial energy distribution of sputtered atoms is given by the Thompson distribution. The Pt flux on the chamber walls and on the...[Show more]

dc.contributor.authorCaillard, A.
dc.contributor.authorCharles, Christine
dc.contributor.authorBoswell, Roderick
dc.contributor.authorBrault, Pascal
dc.date.accessioned2015-12-07T22:39:06Z
dc.date.available2015-12-07T22:39:06Z
dc.identifier.issn0093-3813
dc.identifier.urihttp://hdl.handle.net/1885/23718
dc.description.abstractThe deposition of platinum atoms by argon plasma sputtering has been simulated by using a 3-D Monte Carlo simulation called Sputtered Particles Transport in Gas, which provides spatial and energy distributions of the Pt atoms impinging on the substrate and on the chamber walls. The Yamamura formula provides the Pt sputtering yield from argon ions, whereas the initial energy distribution of sputtered atoms is given by the Thompson distribution. The Pt flux on the chamber walls and on the substrate are compared with experimental deposition rates.
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE Inc)
dc.sourceIEEE Transactions on Plasma Science
dc.subjectKeywords: Argon; Atomic physics; Deposition rates; Electric power distribution; Inert gases; Monte Carlo methods; Plasma deposition; Plasmas; Platinum; Sputter deposition; Sputtering; Three dimensional; Walls (structural partitions); Argon ions; Argon plasmas; Atom Argon; Atomic layer deposition; Deposition; Monte Carlo; Plasma sputtering; Plasmas; Platinum; Silicon; Sputtering; Substrates
dc.titleTransport and Deposition of Plasma-Sputtered Platinum Atoms: Comparison Between Experiments and Simulation
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume36
dc.date.issued2008
local.identifier.absfor020204 - Plasma Physics; Fusion Plasmas; Electrical Discharges
local.identifier.ariespublicationu4515298xPUB28
local.type.statusPublished Version
local.contributor.affiliationCaillard, A., Universite d'Orleans
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBrault, Pascal, Universite d'Orleans
local.bibliographicCitation.issue4
local.bibliographicCitation.startpage884
local.bibliographicCitation.lastpage885
local.identifier.doi10.1109/TPS.2008.924421
dc.date.updated2015-12-07T10:45:27Z
local.identifier.scopusID2-s2.0-50249160171
local.identifier.thomsonID000258618200012
CollectionsANU Research Publications

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