Crack and defect formation in diamond films
In this paper, mechanisms of defect and crack initiation in a diamond film prepared at substrate temperatures are investigated using direct current plasma chemical vapor deposition method. The study is by way of X ray diffraction (XRD), optical microscope (OM), and scanning electron microscopy (SEM) and reveals that initiation of defects and cracks during the growth of diamond films depends strongly on substrate temperature. The defects and impurities formed in high substrate temperatures...[Show more]
|Collections||ANU Research Publications|
|Source:||Proceedings of the 13th International Conference on Fracture|
|01_Li_Crack_and_defect_formation_in_2013.pdf||314.11 kB||Adobe PDF||Request a copy|
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