Open Research: Passivating and Physico-Chemical Properties of Silicon Nitride Deposited by Atmospheric Pressure Plasma for Photovoltaic Applications

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Passivating and Physico-Chemical Properties of Silicon Nitride Deposited by Atmospheric Pressure Plasma for Photovoltaic Applications

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Lecouvreur, P; Larrieu, J; Naude, N; Quoizola, Sebastien; Pouliquen, S; Picard, C; Bêche, E; Bererd, N; Gherardi, N; Monna, R; Pirot, Marko; Jahan, D; Cuevas, Andres; Massines, F

Collections	ANU Research Publications
Date published:	2008
Type:	Conference paper
URI:	http://hdl.handle.net/1885/21963
Source:	Proceedings of the European Photovoltaic Solar Energy Conference 2008
DOI:	10.4229/23rdEUPVSEC2008-2CV.5.2

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