Oxygen diffusion in TiO 2 films studied by electron and ion Rutherford backscattering
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Marmitt, G.G.; Nandi, Sanjoy; Venkatachalam, Dinesh; Elliman, Rob; Vos, Maarten; Grande, P L
Description
The diffusivity of oxygen in thin, sputter-deposited TiO2 films, as can be used in RRAMs, is measured using electron and ion backscattering techniques. The as-grown sample consisted of two layers (Ti16O2 and Ti18O2) and was annealed between 500 °C and 900 °C. The depth profiles of 18O, as measured with both techniques, were similar. The extent of diffusion was much larger than expected from the literature data for O diffusion in single-crystal rutile, suggesting that defects in the...[Show more]
dc.contributor.author | Marmitt, G.G. | |
---|---|---|
dc.contributor.author | Nandi, Sanjoy | |
dc.contributor.author | Venkatachalam, Dinesh | |
dc.contributor.author | Elliman, Rob | |
dc.contributor.author | Vos, Maarten | |
dc.contributor.author | Grande, P L | |
dc.date.accessioned | 2020-12-20T20:57:32Z | |
dc.date.available | 2020-12-20T20:57:32Z | |
dc.identifier.issn | 0040-6090 | |
dc.identifier.uri | http://hdl.handle.net/1885/218298 | |
dc.description.abstract | The diffusivity of oxygen in thin, sputter-deposited TiO2 films, as can be used in RRAMs, is measured using electron and ion backscattering techniques. The as-grown sample consisted of two layers (Ti16O2 and Ti18O2) and was annealed between 500 °C and 900 °C. The depth profiles of 18O, as measured with both techniques, were similar. The extent of diffusion was much larger than expected from the literature data for O diffusion in single-crystal rutile, suggesting that defects in the sputter-deposited film play an essential role in the diffusion process | |
dc.format.mimetype | application/pdf | |
dc.language.iso | en_AU | |
dc.publisher | Elsevier | |
dc.source | Thin Solid Films | |
dc.title | Oxygen diffusion in TiO 2 films studied by electron and ion Rutherford backscattering | |
dc.type | Journal article | |
local.description.notes | Imported from ARIES | |
local.identifier.citationvolume | 629 | |
dc.date.issued | 2017 | |
local.identifier.absfor | 020201 - Atomic and Molecular Physics | |
local.identifier.ariespublication | a383154xPUB5700 | |
local.type.status | Published Version | |
local.contributor.affiliation | Marmitt, G.G., Instituto de Fisica da Universidade Federal do Rio Grande do Sul | |
local.contributor.affiliation | Nandi, Sanjoy, College of Science, ANU | |
local.contributor.affiliation | Venkatachalam, Dinesh, College of Science, ANU | |
local.contributor.affiliation | Elliman, Rob, College of Science, ANU | |
local.contributor.affiliation | Vos, Maarten, College of Science, ANU | |
local.contributor.affiliation | Grande, P L , Instituto de Fisica da Universidade Federal do Rio Grande do Sul | |
local.bibliographicCitation.startpage | 97 | |
local.bibliographicCitation.lastpage | 102 | |
local.identifier.doi | 10.1016/j.tsf.2017.03.024 | |
dc.date.updated | 2020-11-23T10:55:03Z | |
local.identifier.scopusID | 2-s2.0-85016984271 | |
local.identifier.thomsonID | 000401079700014 | |
Collections | ANU Research Publications |
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