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Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma

Thompson, Matt; Magyar, Luke; Corr, Cormac


Complex surface nanostructures were observed in germanium and silicon samples exposed to low energy (24 or 36eV ion kinetic energy) helium plasma. Pyramidal growth is observed in germanium across the temperature range studied (185°C to 336°C), while signifcant modifcation in silicon was only observed at 630°C. Nano-wire growth was observed in both germanium and silicon, and appears to be linked to the strength of the electric feld, which in turn determines the implantation energy of the helium...[Show more]

CollectionsANU Research Publications
Date published: 2019
Type: Journal article
Source: Scientific Reports
DOI: 10.1038/s41598-019-46541-w
Access Rights: Open Access


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