Influence of SiO2 and TiO2 dielectric layers on the atomic intermixing of InxGa1-xAs/InP quantum well structures
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Collections | ANU Research Publications |
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Date published: | 2007 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/20268 |
Source: | Semiconductor Science and Technology |
DOI: | 10.1088/0268-1242/22/9/002 |
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File | Description | Size | Format | Image |
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01_Gareso_Influence_of_SiO2_and_TiO2_2007.pdf | 351.88 kB | Adobe PDF | Request a copy |
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