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Thickness-tunable growth of ultra-large, continuous and high-dielectric h-BN thin films

Zhang, Dujiao; Wu, Feihong; Ying, Qi; Gao, Xinyu; Li, Nan; Wang, Kejing; Yin, Zongyou; Cheng, Yonghong; Meng, Guodong

Description

The outstanding thermal properties, mechanical properties and large optical bandgap of hexagonal boron nitride (h-BN) make it very attractive for various applications in ultrathin 2D microelectronics. However, the synthesis of large lateral size and uniform h-BN thin films with a high breakdown strength still remains a great challenge. Here, we comprehensively investigated the effect of growth conditions on the thickness of h-BN films via low pressure chemical vapor deposition (LPCVD). By...[Show more]

CollectionsANU Research Publications
Date published: 2019-02-21
Type: Journal article
URI: http://hdl.handle.net/1885/201757
Source: Journal of Materials Chemistry C: materials for optical and electronic devices
DOI: 10.1039/c8tc05345f

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