Thickness-tunable growth of ultra-large, continuous and high-dielectric h-BN thin films
The outstanding thermal properties, mechanical properties and large optical bandgap of hexagonal boron nitride (h-BN) make it very attractive for various applications in ultrathin 2D microelectronics. However, the synthesis of large lateral size and uniform h-BN thin films with a high breakdown strength still remains a great challenge. Here, we comprehensively investigated the effect of growth conditions on the thickness of h-BN films via low pressure chemical vapor deposition (LPCVD). By...[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Materials Chemistry C: materials for optical and electronic devices|
|01_Zhang_Thickness-tunable_growth_of_2019.pdf||8.64 MB||Adobe PDF||Request a copy|
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