Skip navigation
Skip navigation

Thickness-tunable growth of ultra-large, continuous and high-dielectric h-BN thin films

Zhang, Dujiao; Wu, Feihong; Ying, Qi; Gao, Xinyu; Li, Nan; Wang, Kejing; Yin, Zongyou; Cheng, Yonghong; Meng, Guodong


The outstanding thermal properties, mechanical properties and large optical bandgap of hexagonal boron nitride (h-BN) make it very attractive for various applications in ultrathin 2D microelectronics. However, the synthesis of large lateral size and uniform h-BN thin films with a high breakdown strength still remains a great challenge. Here, we comprehensively investigated the effect of growth conditions on the thickness of h-BN films via low pressure chemical vapor deposition (LPCVD). By...[Show more]

CollectionsANU Research Publications
Date published: 2019-02-21
Type: Journal article
Source: Journal of Materials Chemistry C: materials for optical and electronic devices
DOI: 10.1039/c8tc05345f


File Description SizeFormat Image
01_Zhang_Thickness-tunable_growth_of_2019.pdf8.64 MBAdobe PDF    Request a copy

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  22 January 2019/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator