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Thin crystalline macroporous silicon solar cells with ion implanted emitter

Ernst, Marco; Schulte-Huxel, Henning; Niepelt, Raphael; Kajari-Schroder, Sarah; Brendel, Rolf

Description

We separate a (34 ± 2) μm-thick macroporous Si layer from an n-type Si wafer by means of electrochemical etching. The porosity is p = (26.2 ± 2.4)%. We use ion implantation to selectively dope the outer surfaces of the macroporous Si layer. No masking

CollectionsANU Research Publications
Date published: 2013
Type: Journal article
URI: http://hdl.handle.net/1885/18418
Source: Energy Procedia
DOI: 10.1016/j.egypro.2013.07.364

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