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Effective surface passivation of crystalline silicon by rf sputtered aluminum oxide

Li, Tsu-Tsung (Andrew); Cuevas, Andres

Description

In recent years, excellent surface passivation has been achieved on both p-type and n-type surfaces of silicon wafers and solar cells using aluminum oxide deposited by plasmaassisted atomic layer deposition. However, alternative deposition methods may offer practical advantages for large-scale manufacturing of solar cells. In this letter we show that radiofrequency magnetron sputtering is capable of depositing negatively-charged aluminum oxide and achieving good surface passivation both on...[Show more]

CollectionsANU Research Publications
Date published: 2009
Type: Journal article
URI: http://hdl.handle.net/1885/17659
Source: Physica Status Solidi: Rapid Research Letters
DOI: 10.1002/pssr.200903140

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