Li, Tsu-Tsung (Andrew); Cuevas, Andres
In recent years, excellent surface passivation has been achieved on both p-type and n-type surfaces of silicon wafers and solar cells using aluminum oxide deposited by plasmaassisted atomic layer deposition. However, alternative deposition methods may offer practical advantages for large-scale manufacturing of solar cells. In this letter we show that radiofrequency magnetron sputtering is capable of depositing negatively-charged aluminum oxide and achieving good surface passivation both on...[Show more]
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