Anomalous Diffusion Mediated by Atom Deposition into a Porous Substrate
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Brault, Pascal; Josserand, Christophe; Bauchire, Jean-Marc; Caillard, A.; Charles, Christine; Boswell, Roderick
Description
Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.
Collections | ANU Research Publications |
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Date published: | 2009 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/17356 |
Source: | Physical Review Letters |
DOI: | 10.1103/PhysRevLett.102.045901 |
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