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Anomalous Diffusion Mediated by Atom Deposition into a Porous Substrate

Brault, Pascal; Josserand, Christophe; Bauchire, Jean-Marc; Caillard, A.; Charles, Christine; Boswell, Roderick


Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.

CollectionsANU Research Publications
Date published: 2009
Type: Journal article
Source: Physical Review Letters
DOI: 10.1103/PhysRevLett.102.045901


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