Parallel photopolymerization of microgear patterns
We report parallel two-photon photopolymerization of microgear patterns by exposing a photoresist to holographically generated optical vortices. The optical vortices are created by imparting a helical pitch onto the incident light using a programmable lithographic phase mask realized with a computer addressable phase-only spatial light modulator. By varying the phase levels of the spatial light modulator, the truncated helical phase of an optical vortex results in output intensity patterns that...[Show more]
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