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Direct Measurement of van der Waals and Diffuse Double-Layer Forces between Titanium Dioxide Surfaces Produced by Atomic Layer Deposition

Walsh, Rick; Nelson, Andrew; Skinner, William Menelaos; Parsons, Drew; Craig, Vincent


The van der Waals forces between titanium dioxide surfaces produced by atomic layer deposition (ALD) at the isoelectric point have been measured and found to agree with the calculated interaction using Lifshitz theory. It is shown that under the right conditions very smooth ALD surfaces are produced. At pH values slightly below and above the isoelectric point, a repulsive diffuse double-layer repulsion was observed and is attributed to positive and negative charging of the surfaces,...[Show more]

CollectionsANU Research Publications
Date published: 2012
Type: Journal article
Source: Journal of Physical Chemistry C
DOI: 10.1021/jp300533m


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