Nanomechanical properties of sputter-deposited HfO₂ and HfₓSi₁ˍₓO₂ thin films
The mechanical properties of sputter-deposited HfO₂ and HfₓSi₁ˍₓO₂films were studied as a function of composition using nanoindentation. The elastic modulus and hardness were measured at room temperature for as-deposited films of varying Hf content and for films subjected to annealing at 1000 °C. The elastic modulus and hardness of as-deposited films were found to increase monotonically with increasing HfO₂ content, with the hardness increasing from 5.0 ± 0.3 GPa for pure SiO₂ to 8.4 ± 0.4 GPa...[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Applied Physics|
|01_Venkatachalam_Nanomechanical_properties_of_2011.pdf||Published Version||875.62 kB||Adobe PDF|
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