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Nanomechanical properties of sputter-deposited HfO₂ and HfₓSi₁ˍₓO₂ thin films

Venkatachalam, D. K.; Bradby, J. E.; Saleh, M. N.; Ruffell, S.; Elliman, R. G.

Description

The mechanical properties of sputter-deposited HfO₂ and HfₓSi₁ˍₓO₂films were studied as a function of composition using nanoindentation. The elastic modulus and hardness were measured at room temperature for as-deposited films of varying Hf content and for films subjected to annealing at 1000 °C. The elastic modulus and hardness of as-deposited films were found to increase monotonically with increasing HfO₂ content, with the hardness increasing from 5.0 ± 0.3 GPa for pure SiO₂ to 8.4 ± 0.4 GPa...[Show more]

CollectionsANU Research Publications
Date published: 2011-08-29
Type: Journal article
URI: http://hdl.handle.net/1885/17051
Source: Journal of Applied Physics
DOI: 10.1063/1.3627155

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