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Unexpected short- and medium-range atomic structure of sputtered amorphous silicon upon thermal annealing

Haberl, Bianca; Bogle, S. N.; Li, T.; McKerracher, I.; Ruffell, S.; Munroe, P.; Williams, J. S.; Abelson, J. R.; Bradby, J. E.

Description

We investigate the structure of magnetron-sputtered (MS) amorphous silicon(a-Si) prepared under standard deposition conditions and compare this to pure ion-implanted (II) a-Si. The structure of both films is characterized in their as-prepared and thermally annealed states. Significant differences are observed in short- and medium-range order following thermal annealing. Whereas II a-Si undergoes structural relaxation toward a continuous random network, MS a-Si exhibits little change....[Show more]

CollectionsANU Research Publications
Date published: 2011-11-07
Type: Journal article
URI: http://hdl.handle.net/1885/16485
Source: Journal of Applied Physics
DOI: 10.1063/1.3658628

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