Nanoscale Structuring in Confined Geometries using Atomic Layer Deposition: Conformal Coating and Nanocavity Formation

Abstract

Nanoscale structuring in confined geometries using atomic layer deposition (ALD) is demonstrated for surfaces of nanochannels in track-etched polymer membranes and in mesoporous silica (SBA-15). Suitable process conditions for conformal ALD coating of polymer membranes and SBA-15 with inorganic oxides (SiO2, TiO2, Al2O3) were developed. On the basis of the oxide-coated layers, nanochannels were further structured by a molecular-templated ALD approach, where calixarene macromolecules are covalently attached to the surface and then embedded into an Al2O3 layer. The removal of calixarene by ozone treatment results in 1–2 nm wide surface nanocavities. Surfaces exposed to different process steps are analyzed by small angle X-ray scattering (SAXS) as well as by X-ray photoelectron and infrared spectroscopy. The proposed nanostructuring process increases the overall surface area, allows controlling the hydrophilicity of the channel surface, and is of interest for studying water and ion transport in confinement.