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Nanoscale Structuring in Confined Geometries using Atomic Layer Deposition: Conformal Coating and Nanocavity Formation

Ruff, Philip; Carrillo-Solano, Mercedes; Ulrich, Nils; Hadley, Andrea; Kluth, Patrick; Toimil-Molares, Maria Eugenia; Trautmann, Christina; Hess, Christian

Description

Nanoscale structuring in confined geometries using atomic layer deposition (ALD) is demonstrated for surfaces of nanochannels in track-etched polymer membranes and in mesoporous silica (SBA-15). Suitable process conditions for conformal ALD coating of polymer membranes and SBA-15 with inorganic oxides (SiO2, TiO2, Al2O3) were developed. On the basis of the oxide-coated layers, nanochannels were further structured by a molecular-templated ALD approach, where calixarene macromolecules are...[Show more]

CollectionsANU Research Publications
Date published: 2018-06-12
Type: Journal article
URI: http://hdl.handle.net/1885/164327
Source: Zeitschrift fur Physikalische Chemie
DOI: 10.1515/zpch-2017-1058
Access Rights: Open Access

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