Nanoscale Structuring in Confined Geometries using Atomic Layer Deposition: Conformal Coating and Nanocavity Formation
Nanoscale structuring in confined geometries using atomic layer deposition (ALD) is demonstrated for surfaces of nanochannels in track-etched polymer membranes and in mesoporous silica (SBA-15). Suitable process conditions for conformal ALD coating of polymer membranes and SBA-15 with inorganic oxides (SiO2, TiO2, Al2O3) were developed. On the basis of the oxide-coated layers, nanochannels were further structured by a molecular-templated ALD approach, where calixarene macromolecules are...[Show more]
|Collections||ANU Research Publications|
|Source:||Zeitschrift fur Physikalische Chemie|
|Access Rights:||Open Access|
|01_Ruff_Nanoscale_Structuring_in_2018.pdf||977.03 kB||Adobe PDF|
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