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Measurement of the energy distribution of trapped and free electrons in a current-free double layer

Takahashi, K.; Charles, C.; Boswell, R. W.; Kaneko, T.; Hatakeyama, R.

Description

In the high potential plasma, upstream of the double layer, the measuredelectron energy distribution function(EEDF) shows a very clear change in slope at energies (εbreak) corresponding to the double layer potential drop. Electrons with lower energy are Maxwellian with a temperature of 8eV, whereas those with higher energy have a temperature of 5eV. The EEDF in the downstream plasma has a temperature of 5eV. Over the range of pressures wherein the double layer and accelerated ion beam are...[Show more]

dc.contributor.authorTakahashi, K.
dc.contributor.authorCharles, C.
dc.contributor.authorBoswell, R. W.
dc.contributor.authorKaneko, T.
dc.contributor.authorHatakeyama, R.
dc.date.accessioned2015-11-09T00:18:32Z
dc.date.available2015-11-09T00:18:32Z
dc.identifier.issn1070-664X
dc.identifier.urihttp://hdl.handle.net/1885/16402
dc.description.abstractIn the high potential plasma, upstream of the double layer, the measuredelectron energy distribution function(EEDF) shows a very clear change in slope at energies (εbreak) corresponding to the double layer potential drop. Electrons with lower energy are Maxwellian with a temperature of 8eV, whereas those with higher energy have a temperature of 5eV. The EEDF in the downstream plasma has a temperature of 5eV. Over the range of pressures wherein the double layer and accelerated ion beam are detected by analysis of a retarding field energy analyzer, the strength of the double layer corresponds to the energy where the slope changes in the EEDF(εbreak). We deduce that the downstream electrons come from upstream electrons that have sufficient energy to overcome the potential of the double layer, and that only a single upstream plasma source is required to maintain this phenomenon.
dc.description.sponsorshipThis work was supported by Tohoku University 21st COE program, System Construction of GlobalNetwork Oriented Information Electronics, and by the Japan Society for the Promotion of Science for Young Scientists. It was also supported by a Visiting Fellowship of the Research School of Physical Sciences and Engineering.
dc.publisherAmerican Institute of Physics (AIP)
dc.rightshttp://www.sherpa.ac.uk/romeo/issn/1070-664X..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 9/11/15). Copyright 2007 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in (citation of published article) and may be found at https://doi.org/
dc.sourcePhysics of Plasmas
dc.subjectKeywords: Double layers; Electron energy distribution; Energy distribution; Potential drop; Electron energy analyzers; Electron temperature; Maxwell equations; Pressure effects; Electron traps
dc.titleMeasurement of the energy distribution of trapped and free electrons in a current-free double layer
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume14
dc.date.issued2007-11-21
local.identifier.absfor020204
local.identifier.ariespublicationu4048219xPUB65
local.publisher.urlhttps://www.aip.org/
local.type.statusPublished Version
local.contributor.affiliationTakahashi, Takashi, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National University
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National University
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Plasma Research Laboratory, The Australian National University
local.contributor.affiliationKaneko, Toshiro, Tohoku University, Japan
local.contributor.affiliationHatakeyama, R, Tohoku University, Japan
local.bibliographicCitation.issue11
local.bibliographicCitation.startpage114503
local.bibliographicCitation.lastpage4
local.identifier.doi10.1063/1.2803763
dc.date.updated2015-12-08T07:33:35Z
local.identifier.scopusID2-s2.0-36649035970
CollectionsANU Research Publications

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