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High brightness inductively coupled plasma source for high current focused ion beam applications

Smith, N. S.; Skoczylas, W. P.; Kellogg, S. M.; Kinion, D. E.; Tesch, P. P.; Sutherland, O.; Aanesland, Ane; Boswell, R. W.


A high brightnessplasmaion source has been developed to address focused ion beam(FIB) applications not satisfied by the liquid metal ion source (LMIS) based FIB. The plasmaFIB described here is capable of satisfying applications requiring high mill rates (>100μm³/s) with non-gallium ions and has demonstrated imaging capabilities with sub- 100-nm resolution. The virtual source size, angular intensity, mass spectra, and energy spread of the source have been determined with argon and xenon. This...[Show more]

CollectionsANU Research Publications
Date published: 2006-11-30
Type: Journal article
Source: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI: 10.1116/1.2366617


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