Fluorine negative ion density measurement in a dual frequency capacitive plasma etch reactor by cavity ring-down spectroscopy
F⁻ negative ions were detected by direct observation of the weak photodetachmentabsorption continuum below 364.5nm by cavity ring-down spectroscopy. The negative ions were generated in a modified industrial dielectricplasmaetch reactor, with 2+27MHz dual frequency capacitive excitation in Ar∕CF₄∕O₂ and Ar∕C₄F₈∕O₂ gas mixtures. The F⁻ signal was superimposed on an unidentified absorption continuum, which was diminished by O₂ addition. The F⁻ densities were in the range of (0.5–3)×10¹¹cm⁻³, and...[Show more]
|Collections||ANU Research Publications|
|Source:||Applied Physics Letters|
|01_Booth_Fluorine_negative_ion_density_2006.pdf||Published Version||116.92 kB||Adobe PDF|
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