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Fluorine negative ion density measurement in a dual frequency capacitive plasma etch reactor by cavity ring-down spectroscopy

Booth, Jean-Paul; Corr, Cormac S.; Curley, Garrett A.; Jolly, Jacques; Guillon, Jean; Földes, Tomas

Description

F⁻ negative ions were detected by direct observation of the weak photodetachmentabsorption continuum below 364.5nm by cavity ring-down spectroscopy. The negative ions were generated in a modified industrial dielectricplasmaetch reactor, with 2+27MHz dual frequency capacitive excitation in Ar∕CF₄∕O₂ and Ar∕C₄F₈∕O₂ gas mixtures. The F⁻ signal was superimposed on an unidentified absorption continuum, which was diminished by O₂ addition. The F⁻ densities were in the range of (0.5–3)×10¹¹cm⁻³, and...[Show more]

CollectionsANU Research Publications
Date published: 2006-04-12
Type: Journal article
URI: http://hdl.handle.net/1885/16388
Source: Applied Physics Letters
DOI: 10.1063/1.2194823

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