Effect of oxygen concentration on nanoindentation-induced phase transformations in ion-implanted amorphous silicon
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Ruffell, S.; Vedi, J.; Bradby, J. E.; Williams, J. S.; Haberl, Bianca
Description
The effect of the local oxygen concentration in ion-implanted amorphous Si (a-Si) on nanoindentation-inducedphase transformations has been investigated. Implantation of oxygen into the a-Sifilms has been used to controllably introduce an approximately constant concentration of oxygen, ranging from ∼10¹⁸ to ∼10²¹ cm⁻³, over the depth range of the phase transformed zones. Nanoindentation was performed under conditions that ensure a phase transformed zone composed completely of Si-III/XII in the...[Show more]
Collections | ANU Research Publications |
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Date published: | 2009-04-21 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/16013 |
Source: | Journal of Applied Physics |
DOI: | 10.1063/1.3097752 |
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01_Ruffell_Effect_of_oxygen_concentration_2009.pdf | 756.48 kB | Adobe PDF |
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