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Optical absorption measurements of silica containing Si nanocrystals produced by ion implantation and thermal annealing

Elliman, R. G.; Lederer, M. J.; Luther-Davies, B.

Description

Optical absorption spectra from silicon-implanted silica slides are shown to contain features due to optical interference. These features, which result from the modified refractive index profile produced by the implant, can readily lead to misinterpretation of absorption spectra. To demonstrate the importance of such effects, silica samples were implanted with 80, 400, and 600 keV Si ions to fluences in the range 0.6–3.0×10¹⁷ Si.cm⁻² and annealed at 1100 °C for 1 h to form Si nanocrystals....[Show more]

CollectionsANU Research Publications
Date published: 2002-02-25
Type: Journal article
URI: http://hdl.handle.net/1885/15949
Source: Applied Physics Letters
DOI: 10.1063/1.1454217

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