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Effects of cross field diffusion in a low pressure high density oxygen/silane plasma

Charles, C.


A low pressure high density oxygen/silane radio frequency (13.56 MHz) plasma coupled in a helicon reactor used for silicon dioxide deposition is characterized by using an energy selective mass spectrometer situated at the wall of the processing chamber: measurements of positive and negative ion energy distribution functions and mass spectra (1⩽amu⩽150) are obtained for various flow-rate ratios (R=O₂/SiH₄=1 to 10 but constant total flow rate of 30 sccm), and for a constant radio frequency power...[Show more]

CollectionsANU Research Publications
Date published: 2002
Type: Journal article
Source: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI: 10.1116/1.1481042


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