Skip navigation
Skip navigation

Low temperature pulsed etching of large glass substrates

Dubost, L.; Belinger, A.; Perrin, J.; Boswell, R. W.


Glass plates of 20 cm diameter have been etched by SF₆ in a pulsed capacitively coupled 13.56 MHz discharge. The plates were mechanically clamped to the cooled substrate holder and allowed to heat due to ion bombardment. The average rf power was set at 220 W and the pulse frequency varied up to 200 kHz for duty cycles between 10% and 100%. For a pressure of 50 mTorr, pulse frequencies around 100 kHz and duty cycles below 30%, the etch rate was about double that of the continuous case and the...[Show more]

CollectionsANU Research Publications
Date published: 2003-05-14
Type: Journal article
Source: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI: 10.1116/1.1575211


File Description SizeFormat Image
01_Dubost_Low_temperature_pulsed_etching_2003.pdf356.33 kBAdobe PDFThumbnail

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  20 July 2017/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator