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Onset of implant-related recombination in self-ion implanted and annealed crystalline silicon

Macdonald, Daniel; Deenapanray, Prakash N. K.; Diez, Stephan


The impact of residual recombination centers after low-energy self-implantation of crystalline silicon wafers and annealing at 900 °C has been determined by bulk carrier lifetime measurements as a function of implant dose. Doses below 10¹³cm⁻² resulted in no measurable increase in recombination, while higher doses caused a linear increase in the recombination center density. This threshold value corresponds to the known critical dose required for the formation of relatively stable dislocation...[Show more]

CollectionsANU Research Publications
Date published: 2004-10-01
Type: Journal article
Source: Journal of Applied Physics
DOI: 10.1063/1.1789630


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