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Trapping of Pd, Au, and Cu by implantation-induced nanocavities and dislocations in Si

Brett, D. A.; Llewellyn, D. J.; Ridgway, M. C.

Description

The gettering of metallic impurities by nanocavities formed in Si is a topic of both scientific importance and technological significance. Metallic precipitates observed in the regions where nanocavities were formed have been considered the result of the metal filling the nanocavities, either as elemental metal or a silicide phase. However, our transmission electron microscopy observations demonstrate that many of these precipitates are concentrated along dislocations, rather than randomly...[Show more]

dc.contributor.authorBrett, D. A.
dc.contributor.authorLlewellyn, D. J.
dc.contributor.authorRidgway, M. C.
dc.date.accessioned2015-10-06T03:47:51Z
dc.date.available2015-10-06T03:47:51Z
dc.identifier.issn0003-6951
dc.identifier.urihttp://hdl.handle.net/1885/15776
dc.description.abstractThe gettering of metallic impurities by nanocavities formed in Si is a topic of both scientific importance and technological significance. Metallic precipitates observed in the regions where nanocavities were formed have been considered the result of the metal filling the nanocavities, either as elemental metal or a silicide phase. However, our transmission electron microscopy observations demonstrate that many of these precipitates are concentrated along dislocations, rather than randomly distributed as expected for precipitates formed by the filling of nanocavities. Consequently, the gettering contribution of dislocations in the lattice caused by nanocavity formation must be considered. For Pd, dislocations are the preferred sites for the precipitation of the metal silicide. We compare results of gettering by nanocavities and dislocations for Pd, Au, and Cu to determine which structure is the dominant influence for the formation of precipitates of these metals and/or their silicides.
dc.publisherAmerican Institute of Physics
dc.rightshttp://www.sherpa.ac.uk/romeo/issn/0003-6951..."Publishers version/PDF may be used on author's personal website, institutional website or institutional repository" from SHERPA/RoMEO site (as at 6/10/15). Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters and may be found at https://doi.org/10.1063/1.2208382
dc.sourceApplied Physics Letters
dc.subjectKeywords: Copper; Gold; Ion implantation; Nanostructured materials; Palladium; Precipitation (chemical); Implantation; Nanocavities; Precipitates; Silicides; Silicon
dc.titleTrapping of Pd, Au, and Cu by implantation-induced nanocavities and dislocations in Si
dc.typeJournal article
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.citationvolume88
dc.date.issued2006-05-31
local.identifier.absfor020406
local.identifier.ariespublicationMigratedxPub13238
local.publisher.urlhttps://www.aip.org/
local.type.statusPublished Version
local.contributor.affiliationBrett, David Alisdair, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Department of Electronic Materials Engineering, The Australian National University
local.contributor.affiliationLlewellyn, David, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Department of Electronic Materials Engineering, The Australian National University
local.contributor.affiliationRidgway, Mark C, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Department of Electronic Materials Engineering, The Australian National University
local.bibliographicCitation.issue22
local.bibliographicCitation.startpage222107
local.identifier.doi10.1063/1.2208382
dc.date.updated2015-12-12T07:50:43Z
local.identifier.scopusID2-s2.0-33744910064
CollectionsANU Research Publications

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