Dry-etch of As₂S₃ thin films for optical waveguide fabrication
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Li, Weitang; Ruan, Yinlan; Luther-Davies, Barry; Rode, Andrei; Boswell, Rod
Description
Plasma etching to As₂S₃ thin films for optical waveguide fabrication has been studied using a helicon plasmaetcher. The etching effects using the processing gases or gas mixtures of O₂, Ar, and CF₄ were compared. It was found that the O₂plasma had no chemical etching effect to the As₂S₃, but it could oxidize the surface of the As₂S₃. The Ar plasma provided a strong ion sputtering effect to the films. The CF₄plasma exhibited a too strong chemical etch to the As₂S₃, leading to serious...[Show more]
Collections | ANU Research Publications |
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Date published: | 2005-10-24 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/15750 |
Source: | Journal of Vacuum Science & Technology A |
DOI: | 10.1116/1.2049308 |
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01_Li_Dry-etch_of_As₂S₃_thin_films_2005.pdf | Published Version | 218.72 kB | Adobe PDF |
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