A General Strategy to Achieve Colossal Permittivity and Low Dielectric Loss Through Constructing Insulator/Semiconductor/Insulator Multilayer Structures
In this work, we propose a route to realize high-performance colossal permittivity (CP) by creating multilayer structures of insulator/semiconductor/insulator. To prove the new concept, we made heavily reduced rutile TiO2 via annealing route in Ar/H2 atmosphere. Dielectric studies show that the maximum dielectric permittivity (~ 3.0 × 104) of our prepared samples is about 100 times higher than that (~ 300) of conventional TiO2. The minimum dielectric loss is 0.03 (at 104–105 Hz). Furthermore,...[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Low Temperature Physics|
|01_Liu_A_General_Strategy_to_Achieve_2018.pdf||1.45 MB||Adobe PDF||Request a copy|
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