Skip navigation
Skip navigation

Properties of al2o3 films deposited by atomic layer deposition for photovoltaic applications

Liang, Wensheng

Description

With the gradual decrease in silicon solar cell thickness, the overall efficiency has become more limited by the surface passivation. It has been recognized that the current dominant p-type silicon solar substrates will be replaced by the n-type materials. This thesis focuses on the properties of ALD aluminium-oxide layers, which is a promising dielectric material for the high efficiency n-type solar cells. Firstly, the impact of laterally non-uniform carrier lifetime on the determination of...[Show more]

CollectionsOpen Access Theses
Date published: 2015
Type: Thesis (PhD)
URI: http://hdl.handle.net/1885/156187
DOI: 10.25911/5d51483a65457

Download

File Description SizeFormat Image
b37327422_Liang_Wensheng.pdf348.77 MBAdobe PDFThumbnail


Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  19 May 2020/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator