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Reactive ion etching of tellurite and chalcogenide waveguides using hydrogen, methane, and argon

Vu, K. T.; Madden, S. J.

Description

The authors report in detail on the reactive plasma etching properties of tellurium and demonstrate a high quality etching process using hydrogen, methane, and argon. Very low loss planar ridge waveguides are demonstrated. Optical losses in tellurium dioxide waveguides below 0.1 dB/cm in most of the near infrared region of the electromagnetic spectrum and at 1550 nm have been achieved—the lowest ever reported by more than an order of magnitude and clearly suitable for planar integrated devices....[Show more]

CollectionsANU Research Publications
Date published: 2011
Type: Journal article
URI: http://hdl.handle.net/1885/15512
Source: Journal of Vacuum Science and Technology A
DOI: 10.1116/1.3528248

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