Reactive ion etching of tellurite and chalcogenide waveguides using hydrogen, methane, and argon
The authors report in detail on the reactive plasma etching properties of tellurium and demonstrate a high quality etching process using hydrogen, methane, and argon. Very low loss planar ridge waveguides are demonstrated. Optical losses in tellurium dioxide waveguides below 0.1 dB/cm in most of the near infrared region of the electromagnetic spectrum and at 1550 nm have been achieved—the lowest ever reported by more than an order of magnitude and clearly suitable for planar integrated devices....[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Vacuum Science and Technology A|
|01_Vu_Reactive_ion_etching_of_2011.pdf||Published Version||269.33 kB||Adobe PDF|
Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.