Charles, C.; Boswell, R. W.; Lieberman, M. A.
A radio frequency (rf) plasma is created at low pressure (∼1 mTorr) in the source tube of a “helicon” excited diffusion system in the absence of a dc magnetic field. The coupling is capacitive for the low source power of 160 W at 13.56 MHz considered here. Temperature measurements of the glass source tube yield a plasma power deposition of ∼35 W. The plasma parameters (density, potential, electron temperature) were measured using a retarding field energy analyzer. An analytical model based on...[Show more]
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