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Graded silicon nitride films: Optics and passivation

Thomson, Andrew; Wan, Yimao; Lal, Niraj; Elliman, Robert


The authors describe a method for graded thin-film deposition requiring a single step that exploits the noninstantaneous replacement of reactant gases. They deposit the graded silicon-nitride films by plasma enhanced chemical vapor deposition. Channeling Rutherford backscattering measurements of the graded films find the N:Si ratio increases sixfold from the c-Si surface to air interfaces. The refractive index at the crystalline silicon/film interface was 2.96 reducing monotonically to 1.95 at...[Show more]

CollectionsANU Research Publications
Date published: 2015
Type: Journal article
Source: Journal of Vacuum Science and Technology A
DOI: 10.1116/1.4935101
Access Rights: Open Access


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