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Nanoimprint lithography for light trapping applications in solar cells

Wang, Er-Chien

Description

In this thesis, substrate conformal imprint lithography (SCIL) process is adopted to fabricate efficient light trapping structures for thin-film solar cells. The SCIL process can achieve economical and large area patterns with high fidelity sub-micron resolution over non-planar surfaces without involving intense curing processes. We study and compare both plasmonic particle arrays and dielectric diffraction grating arrays placed on the rear of thin-film cells for light trapping, and we enhance...[Show more]

CollectionsOpen Access Theses
Type: Thesis (PhD)
URI: http://hdl.handle.net/1885/149990

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