Nanoimprint lithography for light trapping applications in solar cells
In this thesis, substrate conformal imprint lithography (SCIL) process is adopted to fabricate efficient light trapping structures for thin-film solar cells. The SCIL process can achieve economical and large area patterns with high fidelity sub-micron resolution over non-planar surfaces without involving intense curing processes. We study and compare both plasmonic particle arrays and dielectric diffraction grating arrays placed on the rear of thin-film cells for light trapping, and we enhance...[Show more]
|Collections||Open Access Theses|
|b31209282-Wang_E.pdf||71.75 MB||Adobe PDF|
Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.