Optical and electronic properties of MAE textured nanoporous silicon
We present a 3-step metal-assisted chemical etching (MAE) texturing technique to fabricate nanoporous Si (MAE nSi) using mono- and multi-crystalline silicon (mc-si) substrate. We show that only a very short etch back is necessary to obtain low reflectance. The angular distribution of the reflected light suggests that most of the losses due to the surface reflectance can be recovered after encapsulation and this has been validated in this work. We demonstrate that by using the texturing...[Show more]
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|Chong T K et al Optical and electronic 2014.pdf||3.56 MB||Adobe PDF|
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